A new technical paper titled “Oxide Semiconductor for Advanced Memory Architectures: Atomic Layer Deposition, Key Requirement ...
The fabrication of nanoscale devices increasingly relies on techniques that offer atomic‐scale precision, with Atomic Layer Deposition (ALD) and Area-Selective Deposition (ASD) at the forefront. ALD ...
Atomic layer etching (ALE) and atomic layer deposition (ALD) represent pivotal techniques in nanofabrication, enabling control of material removal and growth at the atomic scale. By utilising ...
How atomic-layer deposition and hybrid dielectrics are redefining reliability and scaling for AI-era semiconductors.
Atomic layer deposition (ALD) originated from atomic layer epitaxy, which was introduced in 1970 and initially used in electroluminescent displays. It rapidly revolutionized semiconducting ...
Surface decomposition reactions and growth mechanisms are the key influences on the physicochemical properties of the deposited films. It is therefore essential to fully characterize and understand ...
insights from industryDr. Paul Poodt & Alexander BoumanCTO/Founder & Commercial DirectorSparkNano In this interview, AZoMaterials speaks with Dr. Paul Poodt, CTO, and Alexander Bouman, Business ...
ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...
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